三种消毒溶液对树脂纳米陶瓷CAD/CAM块释放的残留单体的影响。
Effects of three disinfection solutions on residual monomers released from resin nanoceramic CAD/CAM blocks.
作者信息
Akarsu Serdar, Atasoy Samet, Arıkan Merve, Koca Bengisu, Yiğin Sena Nur
机构信息
Ordu University, Faculty of Dentistry, Department of Restorative Dentistry, Turkey.
出版信息
Heliyon. 2024 Jan 19;10(3):e24369. doi: 10.1016/j.heliyon.2024.e24369. eCollection 2024 Feb 15.
The aim of this study was to evaluate the effects of three disinfection solutions on the amount of monomers released from resin nanoceramic CAD/CAM blocks using high performance liquid chromatography (HPLC). Forty resin nanoceramic CAD/CAM (Cerasmart, GC, Japan) samples (12x14 × 2 mm) were divided into four groups; each group was disinfected using one of four solutions (Group 1: no disinfectant; Group 2: 70 % ethanol; Group 3: 2 % glutaraldehyde; and Group 4: 1 % sodium hypochlorite) for 5 min. Analysis of residual monomers (UDMA and Bis-EMA) amounts was performed using an HPLC instrument (Dionex Ultimate 3000, Thermo Fisher Scientific). After 30 days, the amounts of monomers found were as follows: 14.54 ppm for Group 1; 9.28 ppm for Group 2; 10.60 ppm for Group 3; and 2.76 ppm for Group 4 (the smallest monomer amount) (p < 0.001). Disinfection of indirect restorations prior to cementation can reduce the amount of residual monomers remaining from resin nanoceramic CAD/CAM blocks.
本研究的目的是使用高效液相色谱法(HPLC)评估三种消毒溶液对从树脂纳米陶瓷CAD/CAM块释放的单体量的影响。将40个树脂纳米陶瓷CAD/CAM(Cerasmart,GC,日本)样品(12×14×2mm)分为四组;每组使用四种溶液之一进行消毒(第1组:不使用消毒剂;第2组:70%乙醇;第3组:2%戊二醛;第4组:1%次氯酸钠)5分钟。使用HPLC仪器(Dionex Ultimate 3000,赛默飞世尔科技)分析残留单体(UDMA和Bis-EMA)的量。30天后,发现的单体量如下:第1组为14.54ppm;第2组为9.28ppm;第3组为10.60ppm;第4组为2.76ppm(单体量最小)(p<0.001)。在粘结之前对间接修复体进行消毒可以减少树脂纳米陶瓷CAD/CAM块中残留的单体量。