Zhang Xinxiang, Cao Yanrong, Chen Chuan, Wu Linshan, Wang Zhiheng, Su Shuo, Zhang Weiwei, Lv Ling, Zheng Xuefeng, Tian Wenchao, Ma Xiaohua, Hao Yue
School of Electronics & Mechanical Engineering, Xidian University, Xi'an 710071, China.
State Key Discipline Laboratory of Wide Bandgap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071, China.
Micromachines (Basel). 2024 Jul 24;15(8):950. doi: 10.3390/mi15080950.
GaN HEMT devices are sensitive to the single event effect (SEE) caused by heavy ions, and their reliability affects the safe use of space equipment. In this work, a Ge ion (LET = 37 MeV·cm/mg) and Bi ion (LET = 98 MeV·cm/mg) were used to irradiate Cascode GaN power devices by heavy ion accelerator experimental device. The differences of SEE under three conditions: pre-applied electrical stress, different LET values, and gate voltages are studied, and the related damage mechanism is discussed. The experimental results show that the pre-application of electrical stress before radiation leads to an electron de-trapping effect, generating defects within the GaN device. These defects will assist in charge collection so that the drain leakage current of the device will be enhanced. The higher the LET value, the more electron-hole pairs are ionized. Therefore, the charge collected by the drain increases, and the burn-out voltage advances. In the off state, the more negative the gate voltage, the higher the drain voltage of the GaN HEMT device, and the more serious the back-channel effect. This study provides an important theoretical basis for the reliability of GaN power devices in radiation environments.
氮化镓高电子迁移率晶体管(GaN HEMT)器件对重离子引起的单粒子效应(SEE)敏感,其可靠性影响空间设备的安全使用。在这项工作中,利用重离子加速器实验装置,用锗离子(线能量转移LET = 37 MeV·cm²/mg)和铋离子(LET = 98 MeV·cm²/mg)辐照共源共栅氮化镓功率器件。研究了三种条件下的单粒子效应差异:预施加电应力、不同的LET值和栅极电压,并讨论了相关的损伤机制。实验结果表明,辐射前预施加电应力会导致电子脱陷效应,在氮化镓器件内产生缺陷。这些缺陷将有助于电荷收集,从而增强器件的漏极泄漏电流。LET值越高,电离的电子 - 空穴对越多。因此,漏极收集的电荷增加,烧毁电压提前。在关断状态下,栅极电压越负,GaN HEMT器件的漏极电压越高,背沟道效应越严重。本研究为氮化镓功率器件在辐射环境中的可靠性提供了重要的理论依据。