Kim Sunghwan, Das Bamadev, Ji Kang Hyeon, Moghaddam Mahsa Haddadi, Chen Cheng, Cha Jongjin, Namgung Seon, Lee Dukhyung, Kim Dai-Sik
Department of Physics and Center for Atom Scale Electromagnetism, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Korea; and Quantum Photonics Institute, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Korea.
Department of Physics, Chung-Ang University, Seoul, South Korea.
Nanophotonics. 2023 Mar 9;12(8):1481-1489. doi: 10.1515/nanoph-2022-0680. eCollection 2023 Apr.
Cracks are formed along the photolithographically pre-determined lines with extremely high yield and repeatability, when Cu clusters are introduced between planarized Au thin films sequentially deposited on a PET substrate. These clusters act as nanometer-sized spacers preventing the formation of contiguous metallic bond between the adjacent Au layers which will render prepatterned-cracking impossible. While the effective gap width is initially zero in the optical sense from microwaves all the way to the visible, outer-bending the PET substrate allows the gap width tuning into the 100 nm range, with the stability and controllability in the ranges of 100 s and Angstrom-scale, respectively. It is anticipated that our wafer-scale prepatterned crack technology with an unprecedented mixture of macroscopic length and Angstrom-scale controllability will open-up many applications in optoelectronics, quantum photonics and photocatalysis.
当在依次沉积在PET基板上的平面化金薄膜之间引入铜簇时，会沿着光刻预先确定的线条以极高的产量和可重复性形成裂纹。这些簇充当纳米级间隔物，防止相邻金层之间形成连续的金属键，否则将无法进行预图案化裂纹。虽然从微波到可见光在光学意义上有效间隙宽度最初为零，但对PET基板进行外弯曲可使间隙宽度调整到100纳米范围，其稳定性和可控性分别在100秒和埃尺度范围内。预计我们前所未有的宏观长度与埃尺度可控性相结合的晶圆级预图案化裂纹技术将在光电子学、量子光子学和光催化领域开辟许多应用。
