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在云母表面快速组装高度有序的DNA折纸晶格。

Rapid assembly of highly ordered DNA origami lattices at mica surfaces.

作者信息

Pothineni Bhanu Kiran, Barner Jörg, Grundmeier Guido, Contreras David, Castro Mario, Keller Adrian

机构信息

Technical and Macromolecular Chemistry, Paderborn University, Warburger Str. 100, 33098, Paderborn, Germany.

JPK BioAFM Business, Bruker Nano GmbH, Am Studio 2 d, 12489, Berlin, Germany.

出版信息

Discov Nano. 2025 May 7;20(1):77. doi: 10.1186/s11671-025-04254-2.

Abstract

The surface-assisted assembly of DNA origami lattices is a potent method for creating molecular lithography masks. Lattice quality and assembly kinetics are controlled by various environmental parameters, including the employed surface, the assembly temperature, and the ionic composition of the buffer, with optimized parameter combinations resulting in highly ordered lattices that can span surface areas of several cm. Established assembly protocols, however, employ assembly times ranging from hours to days. Here, the assembly of highly ordered hexagonal DNA origami lattices at mica surfaces is observed within few minutes using high-speed atomic force microscopy (HS-AFM). A moderate increase in the DNA origami concentration enables this rapid assembly. While forming a regular lattice takes 10 min at a DNA origami concentration of 4 nM, this time is shortened to about 2 min at a concentration of 6 nM. Increasing the DNA origami concentration any further does not result in shorter assembly times, presumably because DNA origami arrival at the mica surface is diffusion-limited. Over short length scales up to 1 µm, lattice order is independent of the DNA origami concentration. However, at larger length scales of a few microns, a DNA origami concentration of 10 nM yields slightly better order than lower and higher concentrations. Therefore, 10 nM can be considered the optimum concentration for the rapid assembly of highly ordered DNA origami lattices. These results thus represent an important step toward the industrial-scale application of DNA origami-based lithography masks.

摘要

DNA折纸晶格的表面辅助组装是制造分子光刻掩膜的一种有效方法。晶格质量和组装动力学受多种环境参数控制,包括所用表面、组装温度和缓冲液的离子组成,优化的参数组合可形成能覆盖数平方厘米表面积的高度有序晶格。然而,既定的组装方案采用的组装时间从数小时到数天不等。在此,利用高速原子力显微镜(HS-AFM)在几分钟内就观察到了在云母表面高度有序的六边形DNA折纸晶格的组装。DNA折纸浓度的适度增加使得这种快速组装成为可能。在DNA折纸浓度为4 nM时,形成规则规则晶格需要10分钟才能形成,而在浓度为6 nM时,这个时间缩短到了约2分钟。进一步提高DNA折纸浓度并不会使组装时间更短,这可能是因为DNA折纸到达云母表面受扩散限制。在长达1 µm的短长度尺度上,晶格有序度与DNA折纸浓度无关。然而,在几微米的较大长度尺度上,10 nM的DNA折纸浓度产生的有序度略高于较低和较高浓度。因此,10 nM可被视为快速组装高度有序DNA折纸晶格的最佳浓度。这些结果因此代表了朝着基于DNA折纸的光刻掩膜的工业规模应用迈出的重要一步。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b57f/12058615/2bb3d644fc1b/11671_2025_4254_Fig1_HTML.jpg

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