Cai Hongbo, Yang Xiqi, Xu Xiaofei, Zeng Qinghua, Zhou Shenghou, Zheng Zilong, Li Dongdong, Zhang Yongzhe, Yan Hui
College of Materials Science and Engineering, Beijing Key Lab of Microstructure and Properties of Advanced Materials, Beijing University of Technology, Beijing, 100124, P. R. China.
Zhangjiang Laboratory, 100 Haike Road, Zhangjiang Hi-Tech Park, Shanghai, 201210, P. R. China.
Adv Sci (Weinh). 2025 Jul;12(28):e2505929. doi: 10.1002/advs.202505929. Epub 2025 May 8.
Crystalline silicon (c-Si) solar cells dominate the global market, and the development of eco-friendly and cost-effective c-Si compound solar cells with carrier-selective passivated contacts has attracted increasing attention. This work investigated the impact of oxygen vacancies (V) and vanadium (V) doping on molybdenum trioxide (MoO), using a combination of first-principles calculations and device simulations. These V defects accumulated from bulk to surface with lower energy barrier of 1.7 eV, compared to 3.4 eV on surface and 3.8 eV from surface to bulk. The surface V significantly decreased MoO work function from 6.1 eV to 4.8 eV,considering alteration in surface charges from +4 µC cm to -8 µC cm. Vanadium doping increased V transport barrier by 0.1 eV, suppressing defect migration. Meanwhile, it raised work function by 0.26 eV and widened the bandgap by 0.6 eV. As hole transport layer, V-doped MoO on illuminated side of c-Si solar cells boosted absolute efficiency by 1.0%, compared to MoO on rear side; of this increase, 0.2% was attributed to higher work function and 0.8% was due to reduced optical losses. These findings emphasize V-doped MoO in enhancing c-Si compound solar cell performance and in promoting the development of efficient photovoltaic technologies.
晶体硅(c-Si)太阳能电池主导着全球市场,开发具有载流子选择性钝化接触的环保且经济高效的c-Si复合太阳能电池已引起越来越多的关注。这项工作结合第一性原理计算和器件模拟,研究了氧空位(V)和钒(V)掺杂对三氧化钼(MoO)的影响。这些V缺陷从体相到表面积累,其能量势垒较低,为1.7 eV,相比之下,表面的能量势垒为3.4 eV,从表面到体相的能量势垒为3.8 eV。考虑到表面电荷从+4 µC/cm²变为 -8 µC/cm²,表面V使MoO的功函数从6.1 eV显著降低至4.8 eV。钒掺杂使V的传输势垒增加了0.1 eV,抑制了缺陷迁移。同时,它使功函数提高了0.26 eV,使带隙拓宽了0.6 eV。作为空穴传输层,与背面的MoO相比,c-Si太阳能电池光照侧的V掺杂MoO使绝对效率提高了1.0%;在这一提高中,0.2%归因于更高的功函数,0.8%归因于光学损耗的降低。这些发现强调了V掺杂MoO在提高c-Si复合太阳能电池性能以及促进高效光伏技术发展方面的作用。