Jiang Junjie, Wang Xiao, Wang Danyang, Chai Yue, Yang Yue, Ding Lingtong, Guo Xiao, Li Aolin, Xu Tao, Huang Han, Zhou Shen, Luo Zheng, Zhang Jin, Ouyang Fangping, Ding Feng, Wang Zhu-Jun, Wang Shanshan
School of Advanced Materials, Peking University Shenzhen Graduate School, Shenzhen, Guangdong, China.
College of Aerospace Science and Engineering, National University of Defense Technology, Changsha, China.
Nat Commun. 2025 Aug 2;16(1):7119. doi: 10.1038/s41467-025-61849-0.
The epitaxial growth of semiconducting two-dimensional (2D) materials is vital to achieve wafer-scale single-crystalline films for beyond-silicon electronics. However, gaining full control over both in-plane and out-of-plane orientations (i.e., lateral crystal alignments and chirality) is particularly challenging when growing low-symmetry 2D single crystals. Here, using triclinic ReS semiconductor monolayers as a model system, we demonstrate the chirality-controlled epitaxial growth of unidirectional, anisotropic single crystals on an insulating chiral surface via the synergy of terraces, steps, and kinks, yielding >97.5% chirality selectivity and >99% in-plane orientation consistency. The products display an anisotropic ratio of 1.9 in photodetection (comparable to exfoliated samples) and high distinguishability of circularly polarized light. Theoretical calculations combined with a set of microscopy and spectroscopy methods show that terrace facets determine the epitaxial growth direction, while steps and kinks break the degeneracy of ReS in the lateral orientation and chirality. This approach is also applicable to the chiral epitaxy of other low-symmetry 2D single crystals, like monoclinic MoO. Our method extends the range of control over 2D material growth, enabling chirality transfer from the substrate to the crystal, and promotes the large-area synthesis of chirality-selected, single-crystal 2D materials.
半导体二维(2D)材料的外延生长对于实现用于超越硅电子学的晶圆级单晶薄膜至关重要。然而,在生长低对称性二维单晶时,要全面控制面内和面外取向(即横向晶体排列和手性)尤其具有挑战性。在这里,我们以三斜晶系ReS半导体单层作为模型系统,通过平台、台阶和扭结的协同作用,展示了在绝缘手性表面上单向、各向异性单晶的手性控制外延生长,手性选择性大于97.5%,面内取向一致性大于99%。这些产物在光探测中显示出1.9的各向异性比(与剥离样品相当)以及圆偏振光的高分辨能力。理论计算结合一系列显微镜和光谱方法表明,平台面决定外延生长方向,而台阶和扭结打破了ReS在横向取向和手性方面的简并性。这种方法也适用于其他低对称性二维单晶的手性外延,如单斜晶系的MoO。我们的方法扩展了对二维材料生长的控制范围,实现了从衬底到手性晶体的手性转移,并促进了手性选择的单晶二维材料的大面积合成。