Jensen Martin O, Brett Michael J
Department of Electrical and Computer Engineering, University of Alberta, Edmonton, Canada T6G 2V4.
J Nanosci Nanotechnol. 2005 May;5(5):723-8. doi: 10.1166/jnn.2005.092.
We present a new method for making functional patterns in thin films consisting of highly ordered arrays of complex, submicrometer structures, deposited at oblique flux incidence angles using the glancing angle deposition technique. By performing physical vapor deposition on direct write seed layers with intentional point and line lattice defects, we are able to generate embedded air-filled linear and planar patterns in the films in a single-step transfer approach with no need for conventional postdeposition micromachining. The uniformity and porosity of the thin films is fully maintained, with minimal impact on the film morphology adjacent to the patterns. This ability to engineer air-filled patterns is crucial to several promising thin-film applications, including photonic band gap crystals and microfluidics.
我们提出了一种在薄膜中制作功能图案的新方法，该薄膜由复杂的亚微米结构的高度有序阵列组成，使用掠角沉积技术在倾斜通量入射角下沉积。通过在具有故意点和线晶格缺陷的直接写入种子层上进行物理气相沉积，我们能够通过单步转移方法在薄膜中生成嵌入式充气线性和平坦图案，而无需传统的沉积后微加工。薄膜的均匀性和孔隙率得到充分保持，对图案相邻的薄膜形态影响最小。这种设计充气图案的能力对于包括光子带隙晶体和微流体在内的几种有前景的薄膜应用至关重要。
