Le Berre Maël, Yamada Ayako, Reck Lukas, Chen Yong, Baigl Damien
Department of Chemistry, Ecole Normale Supérieure, Paris F-75005, France.
Langmuir. 2008 Mar 18;24(6):2643-9. doi: 10.1021/la703391q. Epub 2008 Feb 16.
We introduce the use of silicon (Si) as a substrate for the electroformation of giant phospholipid vesicles. By taking advantage of the tunability of silicon surface properties, we varied the organization of the phospholipid film on the electrode and studied the consequences on vesicle formation. In particular, we investigated the effects of Si surface chemistry and microtopology on the organization of the phospholipid film and the properties of the final vesicles. We established correlations between chemical homogeneity, film defects, and resulting vesicle size distribution. By considering phospholipid films that are artificially fragmented by electrode microstructures, we showed that the characteristic size of vesicles decreases with a decrease in microstructure dimensions. We finally proposed a way to control the vesicle size distribution by using a micropatterned silicon dioxide layer on a Si substrate.
我们介绍了使用硅（Si）作为巨型磷脂囊泡电形成的底物。通过利用硅表面性质的可调性，我们改变了电极上磷脂膜的组织方式，并研究了其对囊泡形成的影响。特别是，我们研究了硅表面化学和微观拓扑对磷脂膜组织以及最终囊泡性质的影响。我们建立了化学均匀性、膜缺陷与所得囊泡尺寸分布之间的相关性。通过考虑被电极微结构人为分割的磷脂膜，我们表明囊泡的特征尺寸随着微结构尺寸的减小而减小。我们最终提出了一种通过在硅衬底上使用微图案化二氧化硅层来控制囊泡尺寸分布的方法。
