Advances in patterning materials for 193 nm immersion lithography.
作者信息
Sanders Daniel P
机构信息
IBM Almaden Research Center, 650 Harry Road, San Jose, California 95136, USA.
出版信息
Chem Rev. 2010 Jan;110(1):321-60. doi: 10.1021/cr900244n.
PMID:20070116
Abstract
摘要
Zotero 插件