Department of Physics, University of Illinois at Urbana-Champaign, Urbana, Illinois, USA.
Biophys J. 2012 Jan 18;102(2):258-67. doi: 10.1016/j.bpj.2011.10.057.
Voltage sensor domains (VSD) are transmembrane proteins that respond to changes in membrane voltage and modulate the activity of ion channels, enzymes, or in the case of proton channels allow permeation of protons across the cell membrane. VSDs consist of four transmembrane segments, S1-S4, forming an antiparallel helical bundle. The S4 segment contains several positively charged residues, mainly arginines, located at every third position along the helix. In the voltage-gated Shaker K(+) channel, the mutation of the first arginine of S4 to a smaller uncharged amino acid allows permeation of cations through the VSD. These currents, known as ω-currents, pass through the VSD and are distinct from K(+) currents passing through the main ion conduction pore. Here we report molecular dynamics simulations of the ω-current in the resting-state conformation for Kv1.2 and for four of its mutants. The four tested mutants exhibit various degrees of conductivity for K(+) and Cl(-) ions, with a slight selectivity for K(+) over Cl(-). Analysis of the ion permeation pathway, in the case of a highly conductive mutant, reveals a negatively charged constriction region near the center of the membrane that might act as a selectivity filter to prevent permeation of anions through the pore. The residues R1 in S4 and E1 in S2 are located at the narrowest region of the ω-pore for the resting state conformation of the VSD, in agreement with experiments showing that the largest increase in current is produced by the double mutation E1D and R1S.
电压传感器结构域(VSD)是一种跨膜蛋白,可响应膜电压变化并调节离子通道、酶的活性,或者在质子通道的情况下允许质子穿过细胞膜。VSD 由四个跨膜片段 S1-S4 组成,形成反平行的螺旋束。S4 片段包含几个带正电荷的残基,主要是精氨酸,位于螺旋的每第三个位置。在电压门控 Shaker K(+)通道中,S4 的第一个精氨酸突变为较小的不带电荷的氨基酸,允许阳离子通过 VSD 渗透。这些电流称为 ω 电流,通过 VSD 传递,与通过主要离子传导孔传递的 K(+)电流不同。在这里,我们报告了 Kv1.2 及其四个突变体在静息构象下 ω 电流的分子动力学模拟。四个测试的突变体对 K(+)和 Cl(-)离子表现出不同程度的导电性,对 K(+)有轻微的选择性。对高度导电突变体的离子渗透途径的分析表明,在膜的中心附近存在一个带负电荷的收缩区域,该区域可能作为选择性过滤器,防止阴离子通过孔渗透。S4 中的残基 R1 和 S2 中的残基 E1 位于 VSD 静息构象下 ω 孔的最窄区域,这与实验结果一致,实验表明电流的最大增加是由 E1D 和 R1S 的双重突变产生的。