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基于 TiO2 的金属-绝缘体-金属器件中的记忆阻抗。

Memory impedance in TiO2 based metal-insulator-metal devices.

机构信息

1] College of Electronic Science and Engineering, National University of Defense Technology, Changsha 410073, P. R. China [2] Nano Research Group, School of Electronics and Computer Science, University of Southampton, Southampton SO17 1BJ, UK.

Nano Research Group, School of Electronics and Computer Science, University of Southampton, Southampton SO17 1BJ, UK.

出版信息

Sci Rep. 2014 Mar 31;4:4522. doi: 10.1038/srep04522.

Abstract

Large attention has recently been given to a novel technology named memristor, for having the potential of becoming the new electronic device standard. Yet, its manifestation as the fourth missing element is rather controversial among scientists. Here we demonstrate that TiO2-based metal-insulator-metal devices are more than just a memory-resistor. They possess resistive, capacitive and inductive components that can concurrently be programmed; essentially exhibiting a convolution of memristive, memcapacitive and meminductive effects. We show how non-zero crossing current-voltage hysteresis loops can appear and we experimentally demonstrate their frequency response as memcapacitive and meminductive effects become dominant.

摘要

最近,人们对一种名为忆阻器的新型技术给予了极大的关注,因为它有可能成为新的电子设备标准。然而,它作为第四个缺失元素的表现形式在科学家之间存在争议。在这里,我们证明基于 TiO2 的金属-绝缘体-金属器件不仅仅是一个记忆电阻器。它们具有可同时编程的电阻、电容和电感分量;实际上表现出了忆阻、忆容和忆感效应的卷积。我们展示了非零交叉电流-电压滞后回线是如何出现的,并通过实验演示了它们的频率响应,因为忆容和忆感效应变得占主导地位。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/e2c3/3970129/1464a74dae6d/srep04522-f1.jpg

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