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工作在电信波段的硅/有机混合异质结红外光电探测器。

Silicon/organic hybrid heterojunction infrared photodetector operating in the telecom regime.

作者信息

Bednorz Mateusz, Matt Gebhard J, Głowacki Eric D, Fromherz Thomas, Brabec Christoph J, Scharber Markus C, Sitter Helmut, Sariciftci N Serdar

机构信息

Institute for Semiconductor and Solid State Physics, Johannes Kepler University, Altenbergerstraße 69, 4040 Linz, Austria.

Lehrstuhl für Werkstoffe der Elektronik- und Energietechnik, Friedrich-Alexander-Universität Erlangen-Nürnberg, Martensstraße 7, 91058 Erlangen, Germany.

出版信息

Org Electron. 2013 May;14(5):1344-1350. doi: 10.1016/j.orgel.2013.02.009.

DOI:10.1016/j.orgel.2013.02.009
PMID:25132811
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC4130135/
Abstract

The authors report on the fabrication of a silicon/organic heterojunction based IR photodetector. It is demonstrated that an Al/-Si/perylene-derivative/Al heterostructure exhibits a photovoltaic effect up to 2.7 μm (0.46 eV), a value significantly lower than the bandgap of either material. Although the devices are not optimized, at room temperature a rise time of 300 ns, a responsivity of ≈0.2 mA/W with a specific detectivity of  ≈ 7 × 10 Jones at 1.55 μm is found. The achieved responsivity is two orders of magnitude higher compared to our previous efforts [1,2]. It will be outlined that the photocurrent originates from an absorption mechanism involving excitation of an electron from the Si valence band into the extended LUMO state in the perylene-derivative, with possible participation of intermediate localized surface state in the organic material. The non-invasive deposition of the organic interlayer onto the Si results in compatibility with the CMOS process, making the presented approach a potential alternative to all inorganic device concepts.

摘要

作者报道了基于硅/有机异质结的红外光电探测器的制备。结果表明,Al/-Si/苝衍生物/Al异质结构在高达2.7μm(0.46eV)的波长下表现出光伏效应,该值明显低于任何一种材料的带隙。尽管这些器件尚未优化,但在室温下,发现其上升时间为300ns,在1.55μm波长处的响应度约为0.2mA/W,比探测率约为7×10琼斯。与我们之前的工作[1,2]相比,所实现的响应度高出两个数量级。将概述光电流源于一种吸收机制,该机制涉及电子从硅价带激发到苝衍生物的扩展LUMO态,有机材料中的中间局域表面态可能参与其中。有机中间层在硅上的非侵入性沉积导致与CMOS工艺兼容,使得所提出的方法成为所有无机器件概念的潜在替代方案。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0bcd/4130135/47844105d681/gr3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0bcd/4130135/57009ff925e9/fx1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0bcd/4130135/47844105d681/gr3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0bcd/4130135/57009ff925e9/fx1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0bcd/4130135/47844105d681/gr3.jpg

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