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具有稳健且可逆切换拓扑畴态的铁电纳米点高密度阵列。

High-density array of ferroelectric nanodots with robust and reversibly switchable topological domain states.

作者信息

Li Zhongwen, Wang Yujia, Tian Guo, Li Peilian, Zhao Lina, Zhang Fengyuan, Yao Junxiang, Fan Hua, Song Xiao, Chen Deyang, Fan Zhen, Qin Minghui, Zeng Min, Zhang Zhang, Lu Xubing, Hu Shejun, Lei Chihou, Zhu Qingfeng, Li Jiangyu, Gao Xingsen, Liu Jun-Ming

机构信息

Institute for Advanced Materials and Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials, South China Normal University, Guangzhou 510006, China.

Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, 72 Wenhua Road, Shenyang 110016, China.

出版信息

Sci Adv. 2017 Aug 18;3(8):e1700919. doi: 10.1126/sciadv.1700919. eCollection 2017 Aug.

Abstract

The exotic topological domains in ferroelectrics and multiferroics have attracted extensive interest in recent years due to their novel functionalities and potential applications in nanoelectronic devices. One of the key challenges for these applications is a realization of robust yet reversibly switchable nanoscale topological domain states with high density, wherein spontaneous topological structures can be individually addressed and controlled. This has been accomplished in our work using high-density arrays of epitaxial BiFeO (BFO) ferroelectric nanodots with a lateral size as small as ~60 nm. We demonstrate various types of spontaneous topological domain structures, including center-convergent domains, center-divergent domains, and double-center domains, which are stable over sufficiently long time but can be manipulated and reversibly switched by electric field. The formation mechanisms of these topological domain states, assisted by the accumulation of compensating charges on the surface, have also been revealed. These results demonstrated that these reversibly switchable topological domain arrays are promising for applications in high-density nanoferroelectric devices such as nonvolatile memories.

摘要

近年来,铁电体和多铁性材料中的奇异拓扑畴因其新颖的功能以及在纳米电子器件中的潜在应用而引起了广泛关注。这些应用面临的关键挑战之一是实现具有高密度的稳健且可逆切换的纳米级拓扑畴状态,其中自发拓扑结构能够被单独寻址和控制。在我们的工作中,通过使用横向尺寸小至约60 nm的外延BiFeO(BFO)铁电纳米点的高密度阵列实现了这一点。我们展示了各种类型的自发拓扑畴结构,包括中心收敛畴、中心发散畴和双中心畴,它们在足够长的时间内是稳定的,但可以通过电场进行操纵和可逆切换。这些拓扑畴状态的形成机制,在表面补偿电荷积累的辅助下,也已被揭示。这些结果表明,这些可逆切换的拓扑畴阵列在诸如非易失性存储器等高密度纳米铁电器件的应用中具有广阔前景。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2687/5562417/07ddb6be7cb2/1700919-F1.jpg

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