Takahashi Seiji, Huang Yi-Min, Sze Jhy-Jyi, Wu Tung-Ting, Guo Fu-Sheng, Hsu Wei-Cheng, Tseng Tung-Hsiung, Liao King, Kuo Chin-Chia, Chen Tzu-Hsiang, Chiang Wei-Chieh, Chuang Chun-Hao, Chou Keng-Yu, Chung Chi-Hsien, Chou Kuo-Yu, Tseng Chien-Hsien, Wang Chuan-Joung, Yaung Dun-Nien
Taiwan Semiconductor Manufacturing Company, No. 8, Li-Hsin Rd. 6, Hsinchu Science Park, Hsinchu 300, Taiwan.
Sensors (Basel). 2017 Dec 5;17(12):2816. doi: 10.3390/s17122816.
A submicron pixel's light and dark performance were studied by experiment and simulation. An advanced node technology incorporated with a stacked CMOS image sensor (CIS) is promising in that it may enhance performance. In this work, we demonstrated a low dark current of 3.2 e/s at 60 °C, an ultra-low read noise of 0.90 e·rms, a high full well capacity (FWC) of 4100 e, and blooming of 0.5% in 0.9 μm pixels with a pixel supply voltage of 2.8 V. In addition, the simulation study result of 0.8 μm pixels is discussed.
通过实验和模拟研究了亚微米像素的明暗性能。结合堆叠式互补金属氧化物半导体图像传感器(CIS)的先进节点技术很有前景,因为它可能会提高性能。在这项工作中,我们展示了在60°C时3.2 e/s的低暗电流、0.90 e·rms的超低读取噪声、4100 e的高满阱容量(FWC)以及在像素电源电压为2.8 V时0.9μm像素中0.5%的光晕现象。此外,还讨论了0.8μm像素的模拟研究结果。