Department of Micro and Nano Systems, KTH Royal Institute of Technology, 100 44, Stockholm, Sweden.
Adv Mater. 2018 Nov;30(46):e1801124. doi: 10.1002/adma.201801124. Epub 2018 Aug 29.
The ability to manufacture a nanogap in between two electrodes has proven a powerful catalyst for scientific discoveries in nanoscience and molecular electronics. A wide range of bottom-up and top-down methodologies are now available to fabricate nanogaps that are less than 10 nm wide. However, most available techniques involve time-consuming serial processes that are not compatible with large-scale manufacturing of nanogap devices. The scalable manufacturing of sub-10 nm gaps remains a great technological challenge that currently hinders both experimental nanoscience and the prospects for commercial exploitation of nanogap devices. Here, available nanogap fabrication methodologies are reviewed and a detailed comparison of their merits is provided, with special focus on large-scale and reproducible manufacturing of nanogaps. The most promising approaches that could achieve a breakthrough in research and commercial applications are identified. Emerging scalable nanogap manufacturing methodologies will ultimately enable applications with high scientific and societal impact, including high-speed whole genome sequencing, electromechanical computing, and molecular electronics using nanogap electrodes.
在两个电极之间制造纳米间隙的能力已被证明是纳米科学和分子电子学领域科学发现的有力催化剂。现在有各种各样的自下而上和自上而下的方法可用于制造小于 10nm 宽的纳米间隙。然而,大多数可用的技术都涉及耗时的串行过程,与纳米间隙器件的大规模制造不兼容。小于 10nm 间隙的可扩展制造仍然是一个巨大的技术挑战,目前既阻碍了实验纳米科学的发展,也阻碍了纳米间隙器件商业化应用的前景。在这里,回顾了现有的纳米间隙制造方法,并对它们的优点进行了详细的比较,特别关注纳米间隙的大规模和可重复制造。确定了最有希望在研究和商业应用中取得突破的方法。新兴的可扩展纳米间隙制造方法最终将能够实现具有高科学和社会影响的应用,包括高速全基因组测序、机电计算以及使用纳米间隙电极的分子电子学。