Chen Qiaoli, Dwyer Christian, Sheng Guan, Zhu Chongzhi, Li Xiaonian, Zheng Changlin, Zhu Yihan
Center for Electron Microscopy, State Key Laboratory Breeding Base of Green Chemistry Synthesis Technology and College of Chemical Engineering, Zhejiang University of Technology, Hangzhou, 310014, China.
Department of Physics, Arizona State University, Tempe, AZ, 85287-1504, USA.
Adv Mater. 2020 Apr;32(16):e1907619. doi: 10.1002/adma.201907619. Epub 2020 Feb 28.
Electron microscopy allows the extraction of multidimensional spatiotemporally correlated structural information of diverse materials down to atomic resolution, which is essential for figuring out their structure-property relationships. Unfortunately, the high-energy electrons that carry this important information can cause damage by modulating the structures of the materials. This has become a significant problem concerning the recent boost in materials science applications of a wide range of beam-sensitive materials, including metal-organic frameworks, covalent-organic frameworks, organic-inorganic hybrid materials, 2D materials, and zeolites. To this end, developing electron microscopy techniques that minimize the electron beam damage for the extraction of intrinsic structural information turns out to be a compelling but challenging need. This article provides a comprehensive review on the revolutionary strategies toward the electron microscopic imaging of beam-sensitive materials and associated materials science discoveries, based on the principles of electron-matter interaction and mechanisms of electron beam damage. Finally, perspectives and future trends in this field are put forward.
电子显微镜能够提取各种材料的多维时空相关结构信息，分辨率可达原子级别，这对于弄清楚材料的结构-性能关系至关重要。不幸的是，携带这一重要信息的高能电子会通过改变材料结构而造成损伤。对于包括金属有机框架材料、共价有机框架材料、有机-无机杂化材料、二维材料和沸石在内的众多束敏感材料而言，这已成为近期材料科学应用蓬勃发展过程中的一个重大问题。为此，开发能将电子束损伤降至最低以提取固有结构信息的电子显微镜技术，已成为一项迫切而具有挑战性的需求。本文基于电子与物质相互作用原理及电子束损伤机制，对束敏感材料电子显微镜成像的革命性策略及相关材料科学发现进行了全面综述。最后，提出了该领域的观点和未来趋势。
