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分析石墨烯科宾诺结器件中的量子化电阻行为。

Analysing quantized resistance behaviour in graphene Corbino junction devices.

作者信息

Liu Chieh-I, Scaletta Dominick S, Patel Dinesh K, Kruskopf Mattias, Levy Antonio, Hill Heather M, Rigosi Albert F

机构信息

Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States.

Department of Chemistry and Biochemistry, University of Maryland, College Park, MD 20742, United States.

出版信息

J Phys D Appl Phys. 2020;53(27). doi: 10.1088/1361-6463/ab83bb.

DOI:10.1088/1361-6463/ab83bb
PMID:32831402
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7431976/
Abstract

Just a few of the promising applications of graphene Corbino J devices include two-dimensional Dirac fermion microscopes, custom programmable quantized resistors, and mesoscopic valley filters. In some cases, device scalability is crucial, as seen in fields like resistance metrology, where graphene devices are required to accommodate currents of the order 100 μA to be compatible with existing infrastructure. However, fabrication of these devices still poses many difficulties. In this work, unusual quantized resistances are observed in epitaxial graphene Corbino junction devices held at the = 2 plateau ( ≈ 12906 Ω) and agree with numerical simulations performed with the LTspice circuit simulator. The formulae describing experimental and simulated data are empirically derived for generalized placement of up to three current terminals and accurately reflects observed partial edge channel cancellation. These results support the use of ultraviolet lithography as a way to scale up graphene-based devices with suitably narrow junctions that could be applied in a variety of subfields.

摘要

石墨烯科尔比诺结器件的一些有前景的应用包括二维狄拉克费米子显微镜、定制可编程量子电阻器和介观谷滤波器。在某些情况下,器件的可扩展性至关重要,例如在电阻计量等领域,石墨烯器件需要能够承受约100 μA的电流,以便与现有基础设施兼容。然而,这些器件的制造仍然面临许多困难。在这项工作中,在外延石墨烯科尔比诺结器件中观察到异常的量子电阻,该器件处于ν = 2平台(R≈12906 Ω),并且与使用LTspice电路模拟器进行的数值模拟结果一致。针对多达三个电流端子的一般放置情况,通过实验得出了描述实验数据和模拟数据的公式,该公式准确反映了观察到的部分边缘通道抵消现象。这些结果支持使用紫外光刻技术来扩大基于石墨烯的器件规模,这些器件具有合适的窄结,可应用于各种子领域。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3c56/7431976/8861964373a2/nihms-1616338-f0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3c56/7431976/c1ea02db3a5d/nihms-1616338-f0001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3c56/7431976/4c83619722e9/nihms-1616338-f0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3c56/7431976/d2e3e5b3e719/nihms-1616338-f0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3c56/7431976/fa114b09a132/nihms-1616338-f0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3c56/7431976/8861964373a2/nihms-1616338-f0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3c56/7431976/c1ea02db3a5d/nihms-1616338-f0001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3c56/7431976/4c83619722e9/nihms-1616338-f0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3c56/7431976/d2e3e5b3e719/nihms-1616338-f0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3c56/7431976/fa114b09a132/nihms-1616338-f0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3c56/7431976/8861964373a2/nihms-1616338-f0005.jpg

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引用本文的文献

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本文引用的文献

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2
The Quantum Hall Effect in the Era of the New SI.新国际单位制时代的量子霍尔效应
Semicond Sci Technol. 2019;34(9). doi: 10.1088/1361-6641/ab37d3.
3
Atypical Quantized Resistances in Millimeter-Scale Epitaxial Graphene Junctions.毫米级外延石墨烯结中的非典型量子化电阻
Carbon N Y. 2019;154. doi: 10.1016/j.carbon.2019.08.002.
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Next-generation crossover-free quantum Hall arrays with superconducting interconnections.具有超导互连的下一代无交叉量子霍尔阵列。
Metrologia. 2019;56(6). doi: 10.1088/1681-7575/ab3ba3.
5
Comparison between NIST Graphene and AIST GaAs Quantized Hall Devices.美国国家标准与技术研究院(NIST)石墨烯与日本产业技术综合研究所(AIST)砷化镓量子霍尔器件的比较。
IEEE Trans Instrum Meas. 2019;0. doi: 10.1109/tim.2019.2930436.
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Two-Terminal and Multi-Terminal Designs for Next-Generation Quantized Hall Resistance Standards: Contact Material and Geometry.下一代量子化霍尔电阻标准的双端和多端设计:接触材料与几何形状
IEEE Trans Electron Devices. 2019;66(9). doi: 10.1109/ted.2019.2926684.
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Graphene Devices for Tabletop and High-Current Quantized Hall Resistance Standards.用于桌面型和大电流量子化霍尔电阻标准的石墨烯器件。
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