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用于三英寸衬底上单光子发射体的晶圆级外延低密度 InAs/GaAs 量子点

Wafer-Scale Epitaxial Low Density InAs/GaAs Quantum Dot for Single Photon Emitter in Three-Inch Substrate.

作者信息

Huang Xiaoying, Su Rongbin, Yang Jiawei, Rao Mujie, Liu Jin, Yu Ying, Yu Siyuan

机构信息

State Key Laboratory of Optoelectronic Materials and Technologies, School of Electronics and Information Technology, Sun Yat-sen University, Guangzhou 510275, China.

State Key Laboratory of Optoelectronic Materials and Technologies, School of Physics, Sun Yat-sen University, Guangzhou 510275, China.

出版信息

Nanomaterials (Basel). 2021 Apr 6;11(4):930. doi: 10.3390/nano11040930.

DOI:10.3390/nano11040930
PMID:33917459
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8067461/
Abstract

In this work, we successfully achieved wafer-scale low density InAs/GaAs quantum dots (QDs) for single photon emitter on three-inch wafer by precisely controlling the growth parameters. The highly uniform InAs/GaAs QDs show low density of μ0.96/μm2 within the radius of 2 cm. When embedding into a circular Bragg grating cavity on highly efficient broadband reflector (CBR-HBR), the single QDs show excellent optoelectronic properties with the linewidth of 3± 0.08 GHz, the second-order correlation factor g2(τ)=0.0322 ±0.0023, and an exciton life time of 323 ps under two-photon resonant excitation.

摘要

在本工作中,我们通过精确控制生长参数,在三英寸晶圆上成功实现了用于单光子发射体的晶圆级低密度铟砷/砷化镓量子点。高度均匀的铟砷/砷化镓量子点在半径2厘米范围内显示出μ0.96/μm2的低密度。当嵌入高效宽带反射器上的圆形布拉格光栅腔(CBR-HBR)中时,单个量子点表现出优异的光电特性,线宽为3±0.08 GHz,二阶关联因子g2(τ)=0.0322±0.0023,在双光子共振激发下激子寿命为323皮秒。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/9f3321bf1590/nanomaterials-11-00930-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/aedda460fc5a/nanomaterials-11-00930-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/1061986cc565/nanomaterials-11-00930-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/7f0a212c5878/nanomaterials-11-00930-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/775792ae68d5/nanomaterials-11-00930-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/f0f95fc2f0c5/nanomaterials-11-00930-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/9f3321bf1590/nanomaterials-11-00930-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/aedda460fc5a/nanomaterials-11-00930-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/1061986cc565/nanomaterials-11-00930-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/7f0a212c5878/nanomaterials-11-00930-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/775792ae68d5/nanomaterials-11-00930-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/f0f95fc2f0c5/nanomaterials-11-00930-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb10/8067461/9f3321bf1590/nanomaterials-11-00930-g006.jpg

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本文引用的文献

1
Morphological engineering of aluminum droplet etched nanoholes for symmetric GaAs quantum dot epitaxy.用于对称砷化镓量子点外延的铝滴蚀刻纳米孔的形态工程
Nanotechnology. 2020 Dec 4;31(49):495701. doi: 10.1088/1361-6528/abb1e9.
2
A solid-state source of strongly entangled photon pairs with high brightness and indistinguishability.一种具有高亮度和不可区分性的强纠缠光子对的固态源。
Nat Nanotechnol. 2019 Jun;14(6):586-593. doi: 10.1038/s41565-019-0435-9. Epub 2019 Apr 22.
3
Single self-assembled InAs/GaAs quantum dots in photonic nanostructures: The role of nanofabrication.
基于LT-GaAs层的用于单片GaAs/Si集成的位错滤波器
Nanomaterials (Basel). 2022 Dec 14;12(24):4449. doi: 10.3390/nano12244449.
4
Novel InGaSb/AlP Quantum Dots for Non-Volatile Memories.用于非易失性存储器的新型铟镓锑/磷化铝量子点
Nanomaterials (Basel). 2022 Oct 27;12(21):3794. doi: 10.3390/nano12213794.
光子纳米结构中的单个自组装铟砷/砷化镓量子点:纳米加工的作用。
Phys Rev Appl. 2018;9. doi: 10.1103/PhysRevApplied.9.064019.
4
Highly indistinguishable and strongly entangled photons from symmetric GaAs quantum dots.来自对称 GaAs 量子点的高度可分辨和强纠缠光子。
Nat Commun. 2017 May 26;8:15506. doi: 10.1038/ncomms15506.
5
Telecommunication Wavelength-Band Single-Photon Emission from Single Large InAs Quantum Dots Nucleated on Low-Density Seed Quantum Dots.低密度种子量子点上生长的单个大尺寸砷化铟量子点的电信波长波段单光子发射
Nanoscale Res Lett. 2016 Dec;11(1):382. doi: 10.1186/s11671-016-1597-0. Epub 2016 Aug 30.
6
Nanoscale optical positioning of single quantum dots for bright and pure single-photon emission.用于明亮且纯净单光子发射的单量子点的纳米级光学定位
Nat Commun. 2015 Jul 27;6:7833. doi: 10.1038/ncomms8833.
7
InAs/GaAs quantum dots with wide-range tunable densities by simply varying V/III ratio using metal-organic chemical vapor deposition.利用金属有机化学气相沉积法通过简单地改变 V/III 比来实现 InAs/GaAs 量子点的大范围可调密度。
Nanoscale Res Lett. 2013 Aug 28;8(1):367. doi: 10.1186/1556-276X-8-367.
8
In situ accurate control of 2D-3D transition parameters for growth of low-density InAs/GaAs self-assembled quantum dots.原位精确控制二维到三维转变参数,以生长低密度 InAs/GaAs 自组装量子点。
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9
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Nanoscale Res Lett. 2009 Dec 25;5(3):576-580. doi: 10.1007/s11671-009-9507-3.
10
Single photon emission from site-controlled InAs quantum dots grown on GaAs(001) patterned substrates.在图案化的GaAs(001)衬底上生长的位点控制InAs量子点的单光子发射。
ACS Nano. 2009 Jun 23;3(6):1513-7. doi: 10.1021/nn9001566.