Volkov Petr, Lukyanov Andrey, Goryunov Alexander, Semikov Daniil, Vopilkin Evgeniy, Kraev Stanislav, Okhapkin Andrey, Tertyshnik Anatoly, Arkhipova Ekaterina
The Institute for Physics of Microstructures RAS, Academicheskaya Str. 7, 603087 Afonino, Russia.
Sensors (Basel). 2021 Nov 4;21(21):7343. doi: 10.3390/s21217343.
The paper proposes a technology based on UV-LIGA process for microoptoelectromechanical systems (MOEMS) manufacturing. We used the original combination of materials and technological steps, in which any of the materials does not enter chemical reactions with each other, while all of them are weakly sensitive to the effects of oxygen plasma. This made it suitable for long-term etching in the oxygen plasma at low discharge power with the complete preservation of the original geometry, including small parts. The micromembranes were formed by thermal evaporation of Al. This simplified the technique compared to the classic UV-LIGA and guaranteed high quality and uniformity of the resulting structure. To demonstrate the complete process, a test MOEMS with electrostatic control was manufactured. On one chip, a set of micromembranes was created with different stiffness from 10 nm/V to 100 nm/V and various working ranges from 100 to 300 nm. All membranes have a flat frequency response without resonant peaks in the frequency range 0-200 kHz. The proposed technology potentially enables the manufacture of wide low-height membranes of complex geometry to create microoptic fiber sensors.
本文提出了一种基于紫外光刻电铸成型工艺的微机电光系统（MOEMS）制造技术。我们采用了原始的材料组合和工艺步骤，其中任何一种材料之间都不会发生化学反应，而所有材料对氧等离子体的作用都不敏感。这使得它适用于在低放电功率下在氧等离子体中进行长期蚀刻，同时能完全保留原始几何形状，包括小部件。微膜是通过铝的热蒸发形成的。与传统的紫外光刻电铸成型工艺相比，这简化了技术，并保证了所得结构的高质量和均匀性。为了展示整个工艺过程，制造了一个带有静电控制的测试微机电光系统。在一个芯片上，创建了一组具有不同刚度（从10纳米/伏到100纳米/伏）和各种工作范围（从100到300纳米）的微膜。所有膜在0 - 200千赫兹的频率范围内都具有平坦的频率响应，没有共振峰。所提出的技术有可能制造出具有复杂几何形状的宽低高度膜，以制造微光纤传感器。
