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一种用于光电器件的大规模高质量钙钛矿薄膜制备方法。

A route towards the fabrication of large-scale and high-quality perovskite films for optoelectronic devices.

作者信息

Rezaee Ehsan, Kutsarov Dimitar, Li Bowei, Bi Jinxin, Silva S Ravi P

机构信息

Department of Electrical and Electronic Engineering, Advanced Technology Institute (ATI), University of Surrey, Guildford, Surrey, GU2 7XH, UK.

出版信息

Sci Rep. 2022 May 6;12(1):7411. doi: 10.1038/s41598-022-10790-z.

DOI:10.1038/s41598-022-10790-z
PMID:35523822
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9076914/
Abstract

Halide perovskite materials have been extensively explored for their unique electrical, optical, magnetic, and catalytic properties. Most notably, solar cells based on perovskite thin films have improved their power conversion efficiency from 3.8% to over 25% during the last 12 years. However, it is still a challenge to develop a perovskite-based ink, suitable for upscaling the fabrication process of high-quality perovskite films with extreme purity, good crystallinity, and complete coverage over the deposition area. This is particularly important if the perovskite films are to be used for the scaled production of optoelectronic devices. Therefore, to make halide perovskites commercially available for various applications, it is vital to develop a reliable and highly robust deposition method, which can then be transferred to industry. Herein, the development of perovskite precursor inks suitable for use at low-temperature and vacuum-free solution-based deposition processes is reported. These inks can be further tailored according to the requirements of the deposition method, i.e., we propose their use with the industrially viable deposition technique called "slot-die coating". Furthermore, a route for the preparation of low-cost and high-volume manufacturing of perovskite films on both rigid and flexible substrates is suggested in this paper. The presented approach is suitable for the fabrication of any functional layers of perovskites, that can be employed in various scaled applications, and it seeks the potential and the methodology for perovskite film deposition that is scalable to industrial standards.

摘要

卤化物钙钛矿材料因其独特的电学、光学、磁学和催化性能而受到广泛研究。最值得注意的是,基于钙钛矿薄膜的太阳能电池在过去12年中,其功率转换效率已从3.8%提高到超过25%。然而,开发一种适用于扩大高质量钙钛矿薄膜制造工艺规模的钙钛矿基墨水仍然是一项挑战,这种高质量的钙钛矿薄膜要求具有极高的纯度、良好的结晶度以及在沉积区域完全覆盖。如果钙钛矿薄膜要用于光电器件的规模化生产,这一点尤为重要。因此,为了使卤化物钙钛矿能够商业化应用于各种领域,开发一种可靠且高度稳健的沉积方法至关重要,这样才能将其转移到工业生产中。在此,我们报道了适用于低温和无真空溶液基沉积工艺的钙钛矿前驱体墨水的开发。这些墨水可以根据沉积方法的要求进一步定制,即我们建议将其与工业上可行的“狭缝式涂布”沉积技术一起使用。此外,本文还提出了一种在刚性和柔性基板上低成本、大批量制造钙钛矿薄膜的方法。所提出的方法适用于制造钙钛矿的任何功能层,可用于各种规模化应用,并且探索了可扩展到工业标准的钙钛矿薄膜沉积的潜力和方法。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/702dba450ed2/41598_2022_10790_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/abd1bfbd7105/41598_2022_10790_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/f52b7a6e4329/41598_2022_10790_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/e230921f405a/41598_2022_10790_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/d4a3b88677f8/41598_2022_10790_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/041a268b1644/41598_2022_10790_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/702dba450ed2/41598_2022_10790_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/abd1bfbd7105/41598_2022_10790_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/f52b7a6e4329/41598_2022_10790_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/e230921f405a/41598_2022_10790_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/d4a3b88677f8/41598_2022_10790_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/041a268b1644/41598_2022_10790_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f85/9076914/702dba450ed2/41598_2022_10790_Fig6_HTML.jpg

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