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铁电极化和界面缺陷调制的α-InSe纳米薄片中的电阻开关行为

Resistive switching behavior in α-InSe nanoflakes modulated by ferroelectric polarization and interface defects.

作者信息

Hou Pengfei, Xing Siwei, Liu Xin, Chen Cheng, Zhong Xiangli, Wang Jinbin, Ouyang Xiaoping

机构信息

Key Laboratory of Low-dimensional Materials and Application Technology, School of Materials Science and Engineering, Xiangtan University Xiangtan 411105 Hunan China

Science and Technology on Reliability Physics and Application Technology of Electronic Component Laboratory Guangzhou 510610 Guangdong China.

出版信息

RSC Adv. 2019 Sep 26;9(52):30565-30569. doi: 10.1039/c9ra06566k. eCollection 2019 Sep 23.

Abstract

Resistive switching devices based on ferroelectric two-dimensional (2D) van der Waals (vdW) nanomaterials may display simple structures, high density, high speed, and low power consumption, and can be used in flexible electronics and highly integrated devices. However, only a few studies about the in-plane (IP) resistive switching behavior of ferroelectric 2D vdW nanomaterials have been reported because it is very hard to achieve asymmetric barriers only by tuning the IP polarization directions when the electrodes of the planar device are all of the same type. In the current work, we developed a planar device based on an α-InSe nanoflake, in which the IP/OOP (out-of-plane) polarization, free carriers and oxygen vacancies in SiO contribute to the resistive switching behavior of the device. This behavior of the device was shown to be affected by exposure to light, and the photoelectric performance was also investigated when the device was in the OFF state. The demonstration of this planar resistive switching device may promote the further development of resistive devices based on 2D vdW nanomaterials, and provide great inspiration for the development of new kinds of transistors.

摘要

基于铁电二维(2D)范德华(vdW)纳米材料的电阻开关器件可能具有结构简单、高密度、高速和低功耗的特点,可用于柔性电子器件和高度集成的设备。然而,关于铁电二维vdW纳米材料的面内(IP)电阻开关行为的研究报道较少,因为当平面器件的电极类型相同时,仅通过调整IP极化方向很难实现不对称势垒。在当前工作中,我们开发了一种基于α-InSe纳米片的平面器件,其中SiO中的IP/面外(OOP)极化、自由载流子和氧空位有助于该器件的电阻开关行为。该器件的这种行为被证明会受到光照的影响,并且还研究了器件处于关断状态时的光电性能。这种平面电阻开关器件的演示可能会推动基于二维vdW纳米材料的电阻器件的进一步发展,并为新型晶体管的开发提供极大的启发。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/aac0/9072215/61f627780ab5/c9ra06566k-f1.jpg

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