Choi Haeju, Li Jinshu, Kang Taeho, Kang Chanwoo, Son Hyeonje, Jeon Jongwook, Hwang Euyheon, Lee Sungjoo
SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, 440-746, Korea.
Department of Electrical and Electronics Engineering, Konkuk University, Seoul, 05029, Korea.
Nat Commun. 2022 Oct 14;13(1):6076. doi: 10.1038/s41467-022-33770-3.
The Fermi-Dirac distribution of carriers and the drift-diffusion mode of transport represent two fundamental barriers towards the reduction of the subthreshold slope (SS) and the optimization of the energy consumption of field-effect transistors. In this study, we report the realization of steep-slope impact ionization field-effect transistors (IFETs) based on a gate-controlled homogeneous WSe lateral junction. The devices showed average SS down to 2.73 mV/dec over three decades of source-drain current and an on/off ratio of ~10 at room temperature and low bias voltages (<1 V). We determined that the lucky-drift mechanism of carriers is valid in WSe, allowing our IFETs to have high impact ionization coefficients and low SS at room temperature. Moreover, we fabricated a logic inverter based on a WSe IFET and a MoS FET, exhibiting an inverter gain of 73 and almost ideal noise margin for high- and low-logic states. Our results provide a promising approach for developing functional devices as front runners for energy-efficient electronic device technology.
载流子的费米 - 狄拉克分布和漂移 - 扩散输运模式是降低亚阈值斜率(SS)和优化场效应晶体管能耗的两个基本障碍。在本研究中,我们报告了基于栅极控制的均匀WSe横向结实现的陡坡碰撞电离场效应晶体管(IFET)。这些器件在源漏电流的三个数量级范围内平均SS低至2.73 mV/dec,在室温及低偏置电压(<1 V)下的开/关比约为10。我们确定载流子的幸运漂移机制在WSe中有效,使得我们的IFET在室温下具有高碰撞电离系数和低SS。此外,我们基于WSe IFET和MoS FET制造了一个逻辑反相器,其反相器增益为73,对于高逻辑和低逻辑状态几乎具有理想的噪声容限。我们的结果为开发作为节能电子器件技术领跑者的功能器件提供了一种有前景的方法。