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5nm 超薄膜晶铁电体 P(VDF-TrFE)-刷调控,用于亚 60mV/dec 的无迟滞负电容晶体管。

5 nm Ultrathin Crystalline Ferroelectric P(VDF-TrFE)-Brush Tuned for Hysteresis-Free Sub 60 mV dec  Negative-Capacitance Transistors.

机构信息

Van der Waals, Materials Research Center, Department of Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 03722, Republic of Korea.

Center for Nanomedicine, Institute for Basic Science (IBS), Seoul, 03722, Republic of Korea.

出版信息

Adv Mater. 2023 Jun;35(22):e2300478. doi: 10.1002/adma.202300478. Epub 2023 Apr 13.

DOI:10.1002/adma.202300478
PMID:36940281
Abstract

Negative-capacitance field-effect transistors (NC-FETs) have gathered enormous interest as a way to reduce subthreshold swing (SS) and overcome the issue of power dissipation in modern integrated circuits. For stable NC behavior at low operating voltages, the development of ultrathin ferroelectrics (FE), which are compatible with the industrial process, is of great interest. Here, a new scalable ultrathin ferroelectric polymer layer is developed based on trichloromethyl (CCl )-terminated poly(vinylidene difluoride-co-trifloroethylene) (P(VDF-TrFE)) to achieve the state-of-the-art performance of NC-FETs. The crystalline phase of 5-10 nm ultrathin P(VDF-TrFE) is prepared on AlO by a newly developed brush method, which enables an FE/dielectric (DE) bilayer. FE/DE thickness ratios are then systematically tuned at ease to achieve ideal capacitance matching. NC-FETs with optimized FE/DE thickness at a thickness limit demonstrate hysteresis-free operation with an SS of 28 mV dec at ≈1.5 V, which competes with the best reports. This P(VDF-TrFE)-brush layer can be broadly adapted to NC-FETs, opening an exciting avenue for low-power devices.

摘要

负电容场效应晶体管 (NC-FET) 作为一种降低亚阈值摆幅 (SS) 和克服现代集成电路中功耗问题的方法,引起了极大的关注。为了在低工作电压下实现稳定的 NC 行为,开发与工业工艺兼容的超薄铁电体 (FE) 引起了极大的兴趣。在这里,基于三氯甲基 (CCl ) 封端的聚 (偏二氟乙烯-共-三氟乙烯) (P(VDF-TrFE)) 开发了一种新的可扩展超薄铁电聚合物层,以实现 NC-FET 的最先进性能。通过新开发的刷涂方法在 AlO 上制备了 5-10nm 厚的超薄 P(VDF-TrFE) 的晶相,从而形成 FE/介电 (DE) 双层。然后可以轻松系统地调整 FE/DE 的厚度比以实现理想的电容匹配。在厚度限制下,具有优化 FE/DE 厚度的 NC-FET 表现出无滞后的工作状态,在 ≈1.5V 时 SS 为 28mV dec ,可与最佳报告相媲美。这种 P(VDF-TrFE)-刷涂层可以广泛应用于 NC-FET,为低功耗器件开辟了一条令人兴奋的途径。

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