Girolami Marco, Bosi Matteo, Pettinato Sara, Ferrari Claudio, Lolli Riccardo, Seravalli Luca, Serpente Valerio, Mastellone Matteo, Trucchi Daniele M, Fornari Roberto
Istituto di Struttura della Materia, Consiglio Nazionale delle Ricerche (ISM-CNR), Sede Secondaria di Montelibretti, DiaTHEMA Lab, Strada Provinciale 35D, 9, 00010 Roma, Italy.
Istituto dei Materiali per l'Elettronica e il Magnetismo, Consiglio Nazionale delle Ricerche (IMEM-CNR), Parco Area delle Scienze 37/A, 43124 Parma, Italy.
Materials (Basel). 2024 Jan 22;17(2):519. doi: 10.3390/ma17020519.
Orthorhombic κ-GaO thin films were grown for the first time on polycrystalline diamond free-standing substrates by metal-organic vapor phase epitaxy at a temperature of 650 °C. Structural, morphological, electrical, and photoelectronic properties of the obtained heterostructures were evaluated by optical microscopy, X-ray diffraction, current-voltage measurements, and spectral photoconductivity, respectively. Results show that a very slow cooling, performed at low pressure (100 mbar) under a controlled He flow soon after the growth process, is mandatory to improve the quality of the κ-GaO epitaxial thin film, ensuring a good adhesion to the diamond substrate, an optimal morphology, and a lower density of electrically active defects. This paves the way for the future development of novel hybrid architectures for UV and ionizing radiation detection, exploiting the unique features of gallium oxide and diamond as wide-bandgap semiconductors.
通过金属有机气相外延法,首次在多晶金刚石自支撑衬底上于650°C的温度下生长出正交晶系κ-GaO薄膜。分别通过光学显微镜、X射线衍射、电流-电压测量和光谱光电导性对所得异质结构的结构、形态、电学和光电子特性进行了评估。结果表明,在生长过程结束后不久,在受控的氦气流下于低压(100毫巴)下进行非常缓慢的冷却,对于提高κ-GaO外延薄膜的质量是必不可少的,这能确保与金刚石衬底有良好的附着力、最佳的形态以及更低密度的电活性缺陷。这为利用氧化镓和金刚石作为宽带隙半导体的独特特性,开发用于紫外线和电离辐射检测的新型混合架构铺平了道路。