Chappert C, Bernas H, Ferre J, Kottler V, Jamet J, Chen Y, Cambril E, Devolder T, Rousseaux F, Mathet V, Launois H
C. Chappert, V. Kottler, T. Devolder, V. Mathet, Institut d'Electronique Fondamentale, Unite de Recherche Associee CNRS 022, Universite Paris Sud, 91405 Orsay Cedex, France. H. Bernas, Centre de Spectrometrie Nucleaire et de Spectromet.
Science. 1998 Jun 19;280(5371):1919-22. doi: 10.1126/science.280.5371.1919.
By ion irradiation through a lithographically made resist mask, the magnetic properties of cobalt-platinum simple sandwiches and multilayers were patterned without affecting their roughness and optical properties. This was demonstrated on arrays of 1-micrometer lines by near- and far-field magnetooptical microscopy. The coercive force and magnetic anisotropy of the irradiated regions can be accurately controlled by the irradiation fluence. If combined with high-resolution lithography, this technique holds promise for ultrahigh-density magnetic recording applications.
通过光刻制作的抗蚀剂掩膜进行离子辐照，钴铂简单三明治结构和多层结构的磁性被图案化，而不影响其粗糙度和光学性质。通过近场和远场磁光显微镜在1微米线阵列上证明了这一点。辐照区域的矫顽力和磁各向异性可通过辐照通量精确控制。如果与高分辨率光刻相结合，该技术在超高密度磁记录应用方面具有前景。
