Chen Yu-Tung, Lo Tsung-Nan, Chu Yong S, Yi Jaemock, Liu Chi-Jen, Wang Jun-Yue, Wang Cheng-Liang, Chiu Chen-Wei, Hua Tzu-En, Hwu Yeukuang, Shen Qun, Yin Gung-Chian, Liang Keng S, Lin Hong-Ming, Je Jung Ho, Margaritondo Giorgio
Institute of Physics, Academia Sinica, Taipei 115, Taiwan. Department of Materials Engineering, Tatung University, Taipei 104, Taiwan.
Nanotechnology. 2008 Oct 1;19(39):395302. doi: 10.1088/0957-4484/19/39/395302. Epub 2008 Aug 8.
The fabrication of devices to focus hard x-rays is one of the most difficult-and important-challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.
制造用于聚焦硬X射线的器件是纳米技术中最具挑战性且最为重要的难题之一。在此，我们展示了结合30纳米外部区域和高纵横比的菲涅耳波带片最终使硬X射线显微镜突破了30纳米的瑞利空间分辨率水平，并将可测量的空间频率降低到特征尺寸为20 - 23纳米。在介绍了整个纳米制造工艺及表征测试结果后，我们讨论了这些分辨率水平可能产生的研究影响。
