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碳化硅中辐射缺陷动力学的非单调温度依赖性。

Non-monotonic temperature dependence of radiation defect dynamics in silicon carbide.

作者信息

Bayu Aji L B, Wallace J B, Shao L, Kucheyev S O

机构信息

Lawrence Livermore National Laboratory, Livermore, California 94550, USA.

Department of Nuclear Engineering, Texas A&M University, College Station, Texas 77843, USA.

出版信息

Sci Rep. 2016 Aug 3;6:30931. doi: 10.1038/srep30931.

DOI:10.1038/srep30931
PMID:27484358
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC4971475/
Abstract

Understanding response of solids to particle irradiation remains a major materials physics challenge. This applies even to SiC, which is a prototypical nuclear ceramic and wide-band-gap semiconductor material. The lack of predictability is largely related to the complex, dynamic nature of radiation defect formation. Here, we use a novel pulsed-ion-beam method to study dynamic annealing in 4H-SiC ion-bombarded in the temperature range of 25-250 °C. We find that, while the defect recombination efficiency shows an expected monotonic increase with increasing temperature, the defect lifetime exhibits a non-monotonic temperature dependence with a maximum at ~100 °C. This finding indicates a change in the dominant defect interaction mechanism at ~100 °C. The understanding of radiation defect dynamics may suggest new paths to designing radiation-resistant materials.

摘要

理解固体对粒子辐照的响应仍然是材料物理学的一项重大挑战。这甚至适用于碳化硅,它是一种典型的核陶瓷和宽带隙半导体材料。缺乏可预测性很大程度上与辐射缺陷形成的复杂动态性质有关。在这里,我们使用一种新颖的脉冲离子束方法来研究在25-250°C温度范围内被离子轰击的4H-SiC中的动态退火。我们发现,虽然缺陷复合效率随温度升高呈现预期的单调增加,但缺陷寿命表现出非单调的温度依赖性,在约100°C时达到最大值。这一发现表明在约100°C时主导缺陷相互作用机制发生了变化。对辐射缺陷动力学的理解可能为设计抗辐射材料指明新的途径。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ddcc/4971475/6b4f02dc3c5c/srep30931-f5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ddcc/4971475/c9400a66b15e/srep30931-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ddcc/4971475/9c7a9b8bbf1d/srep30931-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ddcc/4971475/4e1aaaee72c6/srep30931-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ddcc/4971475/3494f227eaa8/srep30931-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ddcc/4971475/6b4f02dc3c5c/srep30931-f5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ddcc/4971475/c9400a66b15e/srep30931-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ddcc/4971475/9c7a9b8bbf1d/srep30931-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ddcc/4971475/4e1aaaee72c6/srep30931-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ddcc/4971475/3494f227eaa8/srep30931-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ddcc/4971475/6b4f02dc3c5c/srep30931-f5.jpg

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本文引用的文献

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Single-photon emitting diode in silicon carbide.碳化硅中的单光子发射二极管。
Nat Commun. 2015 Jul 23;6:7783. doi: 10.1038/ncomms8783.
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Sci Rep. 2017 Mar 17;7:44703. doi: 10.1038/srep44703.
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The role of Frenkel defect diffusion in dynamic annealing in ion-irradiated Si.离子辐照硅中弗仑克尔缺陷扩散在动态退火中的作用。
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