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通过氧化条件调节的定制二进制和多层 HfO 基忆阻器。

Customized binary and multi-level HfO-based memristors tuned by oxidation conditions.

机构信息

School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, 430074, China.

Wuhan National Laboratory for Optoelectronics, Wuhan, 430074, China.

出版信息

Sci Rep. 2017 Aug 30;7(1):10070. doi: 10.1038/s41598-017-09413-9.

DOI:10.1038/s41598-017-09413-9
PMID:28855562
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5577168/
Abstract

The memristor is a promising candidate for the next generation non-volatile memory, especially based on HfO, given its compatibility with advanced CMOS technologies. Although various resistive transitions were reported independently, customized binary and multi-level memristors in unified HfO material have not been studied. Here we report Pt/HfO/Ti memristors with double memristive modes, forming-free and low operation voltage, which were tuned by oxidation conditions of HfO films. As O/Hf ratios of HfO films increase, the forming voltages, SET voltages, and R/R windows increase regularly while their resistive transitions undergo from gradually to sharply in I/V sweep. Two memristors with typical resistive transitions were studied to customize binary and multi-level memristive modes, respectively. For binary mode, high-speed switching with 10 pulses (10 ns) and retention test at 85 °C (>10 s) were achieved. For multi-level mode, the 12-levels stable resistance states were confirmed by ongoing multi-window switching (ranging from 10 ns to 1 μs and completing 10 cycles of each pulse). Our customized binary and multi-level HfO-based memristors show high-speed switching, multi-level storage and excellent stability, which can be separately applied to logic computing and neuromorphic computing, further suitable for in-memory computing chip when deposition atmosphere may be fine-tuned.

摘要

忆阻器是下一代非易失性存储器的候选者,特别是基于 HfO 的忆阻器,因为它与先进的 CMOS 技术兼容。尽管已经独立报道了各种电阻转变,但在统一的 HfO 材料中定制的二进制和多级忆阻器尚未被研究。在这里,我们报告了 Pt/HfO/Ti 忆阻器,具有双忆阻模式、无形成和低工作电压,其通过 HfO 薄膜的氧化条件进行调节。随着 HfO 薄膜中 O/Hf 比值的增加,形成电压、SET 电压和 R/R 窗口逐渐增加,而其电阻转变在 I/V 扫描中从逐渐变为急剧。研究了两个具有典型电阻转变的忆阻器,分别定制二进制和多级忆阻模式。对于二进制模式,实现了 10 个脉冲(10 ns)的高速开关和 85°C(>10 s)的保持测试。对于多级模式,通过持续的多窗口开关(范围从 10 ns 到 1 μs,每个脉冲完成 10 个循环)确认了 12 个稳定的电阻状态。我们定制的二进制和多级 HfO 基忆阻器具有高速开关、多级存储和优异的稳定性,可分别应用于逻辑计算和神经形态计算,进一步适用于沉积气氛可微调的内存计算芯片。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/b0d549b786b9/41598_2017_9413_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/937a97af3c01/41598_2017_9413_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/13ca531460db/41598_2017_9413_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/3aaa996138bf/41598_2017_9413_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/aa1f4cff5178/41598_2017_9413_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/f308b0d114cd/41598_2017_9413_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/b0d549b786b9/41598_2017_9413_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/937a97af3c01/41598_2017_9413_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/13ca531460db/41598_2017_9413_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/3aaa996138bf/41598_2017_9413_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/aa1f4cff5178/41598_2017_9413_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/f308b0d114cd/41598_2017_9413_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/142c/5577168/b0d549b786b9/41598_2017_9413_Fig6_HTML.jpg

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