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用于低电压高分辨率X射线图像传感器的大规模Cl掺杂CdTe薄膜的直接热生长

Direct Thermal Growth of Large Scale Cl-doped CdTe Film for Low Voltage High Resolution X-ray Image Sensor.

作者信息

Lee Silah, Kim Jin Sung, Ko Kyeong Rok, Lee Gun Hwan, Lee Dong Jin, Kim Dong Wook, Kim Jin Eui, Kim Ho Kyung, Kim Dong Woon, Im Seongil

机构信息

Department of Physics and Institute of Physics and Applied Physics, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul, 120-749, Korea.

Department Of Surface Technology, Korea Institute of Materials Science (KIMS), 797 Changwon-daero, Seongsan-gu, Changwon-si, Gyeongsangnam-do, 51508, Korea.

出版信息

Sci Rep. 2018 Oct 4;8(1):14810. doi: 10.1038/s41598-018-33240-1.

Abstract

Polycrystalline cadmium telluride (CdTe) X-ray photodetector with advanced performance was fabricated in a Schottky diode form by direct thermal deposition (evaporation) on pixelized complementary metal oxide semiconductor (CMOS) readout panel. Our CdTe X-ray detector shows such a variety of benefits as relatively low process temperature, low cost, low operation voltage less than 40 V, and higher sensitivity and spatial resolution than those of commercial a-Se detectors. CdTe has cubic Zinc Blende structure and maintains p-type conduction after growth in general. For low voltage operation, we succeeded in Cl doping at all stage of CdTe film deposition, and as a result, hole concentration of p-type CdTe was reduced to ~10 cm from ~10 cm, and such concentration reduction could enable our Schottky diode with Ti electrode to operate at a reverse bias of less than 40 V. Our CdTe Schottky diode/CMOS pixel array as a direct conversion type imager demonstrates much higher resolution X-ray imaging in 7 × 9 cm large scale than that of CsI/CMOS array, an indirect conversion imager. To our limited knowledge, our results on polycrystalline CdTe Schottky diode/CMOS array would be very novel as a first demonstration of active pixel sensor system equipped with directly deposited large scale X-ray detector.

摘要

通过在像素化互补金属氧化物半导体(CMOS)读出面板上直接热沉积(蒸发),以肖特基二极管形式制造了具有先进性能的多晶碲化镉(CdTe)X射线光电探测器。我们的CdTe X射线探测器具有多种优点,如工艺温度相对较低、成本低、工作电压低于40 V,并且比商用非晶硒(a-Se)探测器具有更高的灵敏度和空间分辨率。CdTe具有立方闪锌矿结构,一般在生长后保持p型导电。为了实现低电压操作,我们在CdTe薄膜沉积的各个阶段成功进行了Cl掺杂,结果,p型CdTe的空穴浓度从10¹⁵ cm⁻³降低到10¹³ cm⁻³,这种浓度降低使得我们带有Ti电极的肖特基二极管能够在小于40 V的反向偏压下工作。我们的CdTe肖特基二极管/CMOS像素阵列作为直接转换型成像器,在7×9 cm的大尺寸上展示了比间接转换成像器CsI/CMOS阵列更高分辨率的X射线成像。据我们所知,我们关于多晶CdTe肖特基二极管/CMOS阵列的结果作为配备直接沉积大尺寸X射线探测器的有源像素传感器系统的首次演示将非常新颖。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3667/6172199/1b581006963c/41598_2018_33240_Fig1_HTML.jpg

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