• 文献检索
  • 文档翻译
  • 深度研究
  • 学术资讯
  • Suppr Zotero 插件Zotero 插件
  • 邀请有礼
  • 套餐&价格
  • 历史记录
应用&插件
Suppr Zotero 插件Zotero 插件浏览器插件Mac 客户端Windows 客户端微信小程序
定价
高级版会员购买积分包购买API积分包
服务
文献检索文档翻译深度研究API 文档MCP 服务
关于我们
关于 Suppr公司介绍联系我们用户协议隐私条款
关注我们

Suppr 超能文献

核心技术专利:CN118964589B侵权必究
粤ICP备2023148730 号-1Suppr @ 2026

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验

金属辅助化学蚀刻中的电子注入作为无电镀发电的基本机制。

Electron Injection in Metal Assisted Chemical Etching as a Fundamental Mechanism for Electroless Electricity Generation.

作者信息

Li Shengyang, Chen Kexun, Vähänissi Ville, Radevici Ivan, Savin Hele, Oksanen Jani

机构信息

Engineered Nanosystems Group, School of Science, Aalto University, Tietotie 1, Espoo, 02150, Finland.

Department of Electronics and Nanoengineering, Aalto University, Tietotie 3, Espoo, 02150, Finland.

出版信息

J Phys Chem Lett. 2022 Jun 23;13(24):5648-5653. doi: 10.1021/acs.jpclett.2c01302. Epub 2022 Jun 16.

DOI:10.1021/acs.jpclett.2c01302
PMID:35708355
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9234978/
Abstract

Metal-assisted chemical etching (MACE) is a widely applied process for fabricating Si nanostructures. As an electroless process, it does not require a counter electrode, and it is usually considered that only holes in the Si valence band contribute to the process. In this work, a charge carrier collecting p-n junction structure coated with silver nanoparticles is used to demonstrate that also electrons in the conduction band play a fundamental role in MACE, and enable an electroless chemical energy conversion process that was not previously reported. The studied structures generate electricity at a power density of 0.43 mW/cm during MACE. This necessitates reformulating the microscopic electrochemical description of the Si-metal-oxidant nanosystems to separately account for electron and hole injections into the conduction and valence band of Si. Our work provides new insight into the fundamentals of MACE and demonstrates a radically new route to chemical energy conversion by solar cell-inspired devices.

摘要

金属辅助化学蚀刻(MACE)是一种广泛应用于制造硅纳米结构的工艺。作为一种无电镀工艺,它不需要对电极,并且通常认为只有硅价带中的空穴对该工艺有贡献。在这项工作中,使用涂有银纳米颗粒的电荷载流子收集p-n结结构来证明导带中的电子在MACE中也起着基本作用,并实现了一种以前未报道过的无电镀化学能量转换过程。所研究的结构在MACE过程中以0.43 mW/cm的功率密度发电。这就需要重新构建硅-金属-氧化剂纳米系统的微观电化学描述,以分别考虑电子和空穴注入到硅的导带和价带中。我们的工作为MACE的基本原理提供了新的见解,并展示了一条受太阳能电池启发的设备进行化学能量转换的全新途径。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/364c/9234978/dbb084f97571/jz2c01302_0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/364c/9234978/7765fd74c83d/jz2c01302_0001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/364c/9234978/1b45ce981f5a/jz2c01302_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/364c/9234978/c8b6021a0bce/jz2c01302_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/364c/9234978/dd71ef3dd9b0/jz2c01302_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/364c/9234978/dbb084f97571/jz2c01302_0005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/364c/9234978/7765fd74c83d/jz2c01302_0001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/364c/9234978/1b45ce981f5a/jz2c01302_0002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/364c/9234978/c8b6021a0bce/jz2c01302_0003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/364c/9234978/dd71ef3dd9b0/jz2c01302_0004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/364c/9234978/dbb084f97571/jz2c01302_0005.jpg

相似文献

1
Electron Injection in Metal Assisted Chemical Etching as a Fundamental Mechanism for Electroless Electricity Generation.金属辅助化学蚀刻中的电子注入作为无电镀发电的基本机制。
J Phys Chem Lett. 2022 Jun 23;13(24):5648-5653. doi: 10.1021/acs.jpclett.2c01302. Epub 2022 Jun 16.
2
In Situ PL and SPV Monitored Charge Carrier Injection During Metal Assisted Etching of Intrinsic a-Si Layers on c-Si.在c-Si上本征a-Si层的金属辅助蚀刻过程中,通过原位光致发光(PL)和表面光电压(SPV)监测电荷载流子注入
ACS Appl Mater Interfaces. 2015 Jun 3;7(21):11654-9. doi: 10.1021/acsami.5b02922. Epub 2015 May 22.
3
Metal-Assisted Chemical Etching and Electroless Deposition for Fabrication of Hard X-ray Pd/Si Zone Plates.用于制造硬X射线钯/硅波带片的金属辅助化学蚀刻和化学镀
Micromachines (Basel). 2020 Mar 13;11(3):301. doi: 10.3390/mi11030301.
4
Integration of silicon nanostructures for health and energy applications using MACE: a cost-effective process.使用 MACE 实现健康和能源应用的硅纳米结构集成:一种具有成本效益的工艺。
Nanotechnology. 2024 Aug 1;35(42). doi: 10.1088/1361-6528/ad59ad.
5
Controlling the Nature of Etched Si Nanostructures: High- versus Low-Load Metal-Assisted Catalytic Etching (MACE) of Si Powders.控制蚀刻硅纳米结构的性质:硅粉的高负载与低负载金属辅助催化蚀刻(MACE)
ACS Appl Mater Interfaces. 2020 Jan 29;12(4):4787-4796. doi: 10.1021/acsami.9b20514. Epub 2020 Jan 13.
6
Low-Load Metal-Assisted Catalytic Etching Produces Scalable Porosity in Si Powders.低负载金属辅助催化蚀刻在硅粉中产生可扩展的孔隙率。
ACS Appl Mater Interfaces. 2020 Oct 28;12(43):48969-48981. doi: 10.1021/acsami.0c13980. Epub 2020 Oct 14.
7
Metal assisted anodic etching of silicon.金属辅助的硅阳极电化学蚀刻。
Nanoscale. 2015 Jul 7;7(25):11123-34. doi: 10.1039/c5nr01916h. Epub 2015 Jun 10.
8
Direct Visualization of Etching Trajectories in Metal-Assisted Chemical Etching of Si by the Chemical Oxidation of Porous Sidewalls.通过多孔侧壁的化学氧化直接观察硅的金属辅助化学蚀刻中的蚀刻轨迹
Langmuir. 2015 Sep 29;31(38):10549-54. doi: 10.1021/acs.langmuir.5b02453. Epub 2015 Sep 16.
9
Unveiling the shape-diversified silicon nanowires made by HF/HNO3 isotropic etching with the assistance of silver.揭示在银的辅助下通过HF/HNO₃各向同性蚀刻制备的形状多样的硅纳米线。
Nanoscale. 2015 Jan 21;7(3):1216-23. doi: 10.1039/c4nr05949b.
10
The mechanism of galvanic/metal-assisted etching of silicon.硅的电偶/金属辅助刻蚀机制。
Nanoscale Res Lett. 2014 Aug 26;9(1):432. doi: 10.1186/1556-276X-9-432. eCollection 2014.

引用本文的文献

1
Microbial Patterns in Newly Diagnosed Inflammatory Bowel Disease Revealed by Presence and Transcriptional Activity - Relationship to Diagnosis and Outcome.通过存在情况和转录活性揭示的新诊断炎症性肠病中的微生物模式——与诊断和结局的关系
Clin Exp Gastroenterol. 2025 May 21;18:103-119. doi: 10.2147/CEG.S504459. eCollection 2025.
2
Serum bile acids profiles are altered without change of the gut microbiota composition following a seven-day prednisolone therapy in severe alcoholic hepatitis.血清胆汁酸谱在严重酒精性肝炎患者七天泼尼松龙治疗后发生改变,而肠道微生物组成没有变化。
Gut Microbes. 2024 Jan-Dec;16(1):2382767. doi: 10.1080/19490976.2024.2382767. Epub 2024 Jul 30.
3

本文引用的文献

1
Plasmon-Enhanced, Self-Traced Nanomotors on the Surface of Silicon.硅表面的等离子体增强自追踪纳米马达
Angew Chem Int Ed Engl. 2021 Nov 15;60(47):24958-24967. doi: 10.1002/anie.202108487. Epub 2021 Oct 18.
2
Structuring of Si into Multiple Scales by Metal-Assisted Chemical Etching.通过金属辅助化学蚀刻将硅构建成多尺度结构。
Adv Mater. 2021 Nov;33(47):e2005932. doi: 10.1002/adma.202005932. Epub 2021 May 19.
3
Replacing Metals with Oxides in Metal-Assisted Chemical Etching Enables Direct Fabrication of Silicon Nanowires by Solution Processing.
Genetic mutation in genome during adaptation to the murine intestine is optimized for the host diet.
在适应小鼠肠道的过程中,基因组中的基因突变会根据宿主饮食进行优化。
mSystems. 2024 Feb 20;9(2):e0112323. doi: 10.1128/msystems.01123-23. Epub 2024 Jan 11.
4
Geographical survey of the mycobiome and microbiome of Southern California glassy-winged sharpshooters.南加州玻璃翅蝉的真菌组和微生物组的地理调查。
mSphere. 2023 Oct 24;8(5):e0026723. doi: 10.1128/msphere.00267-23. Epub 2023 Oct 6.
在金属辅助化学蚀刻中用氧化物替代金属可通过溶液处理直接制备硅纳米线。
Nano Lett. 2021 Mar 10;21(5):2310-2317. doi: 10.1021/acs.nanolett.1c00178. Epub 2021 Feb 18.
4
Silicon Nanowires Synthesis by Metal-Assisted Chemical Etching: A Review.金属辅助化学蚀刻法合成硅纳米线综述
Nanomaterials (Basel). 2021 Feb 3;11(2):383. doi: 10.3390/nano11020383.
5
Low-Load Metal-Assisted Catalytic Etching Produces Scalable Porosity in Si Powders.低负载金属辅助催化蚀刻在硅粉中产生可扩展的孔隙率。
ACS Appl Mater Interfaces. 2020 Oct 28;12(43):48969-48981. doi: 10.1021/acsami.0c13980. Epub 2020 Oct 14.
6
Revealing Crystallization-Induced Blue-Shift Emission of a Di-Boron Complex by Enhanced Photoluminescence and Electrochemiluminescence.通过增强光致发光和电化学发光揭示二硼配合物的结晶诱导蓝移发射
Angew Chem Int Ed Engl. 2020 Sep 28;59(40):17461-17466. doi: 10.1002/anie.202007588. Epub 2020 Aug 11.
7
CMOS-Compatible and Low-Cost Thin Film MACE Approach for Light-Emitting Si NWs Fabrication.用于制造发光硅纳米线的互补金属氧化物半导体兼容且低成本的薄膜金属辅助化学蚀刻方法
Nanomaterials (Basel). 2020 May 18;10(5):966. doi: 10.3390/nano10050966.
8
Kinked Silicon Nanowires: Superstructures by Metal-Assisted Chemical Etching.扭曲的硅纳米线:金属辅助化学刻蚀的超结构。
Nano Lett. 2019 Nov 13;19(11):7681-7690. doi: 10.1021/acs.nanolett.9b02568. Epub 2019 Oct 15.
9
Particulate Photocatalysts for Light-Driven Water Splitting: Mechanisms, Challenges, and Design Strategies.用于光驱动水分解的颗粒光催化剂:机理、挑战与设计策略
Chem Rev. 2020 Jan 22;120(2):919-985. doi: 10.1021/acs.chemrev.9b00201. Epub 2019 Aug 8.
10
CMOS-Compatible Catalyst for MacEtch: Titanium Nitride-Assisted Chemical Etching in Vapor phase for High Aspect Ratio Silicon Nanostructures.用于MacEtch的CMOS兼容催化剂:用于高深宽比硅纳米结构的气相氮化钛辅助化学蚀刻
ACS Appl Mater Interfaces. 2019 Jul 31;11(30):27371-27377. doi: 10.1021/acsami.9b00871. Epub 2019 Jul 22.