Key Laboratory of Artificial Structures and Quantum Control (Ministry of Education), Shenyang National Laboratory for Materials Science, School of Physics and Astronomy, Shanghai Jiao Tong University, Shanghai, China.
Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, China.
Nature. 2024 Apr;628(8009):758-764. doi: 10.1038/s41586-024-07243-0. Epub 2024 Mar 27.
Van der Waals encapsulation of two-dimensional materials in hexagonal boron nitride (hBN) stacks is a promising way to create ultrahigh-performance electronic devices. However, contemporary approaches for achieving van der Waals encapsulation, which involve artificial layer stacking using mechanical transfer techniques, are difficult to control, prone to contamination and unscalable. Here we report the transfer-free direct growth of high-quality graphene nanoribbons (GNRs) in hBN stacks. The as-grown embedded GNRs exhibit highly desirable features being ultralong (up to 0.25 mm), ultranarrow (<5 nm) and homochiral with zigzag edges. Our atomistic simulations show that the mechanism underlying the embedded growth involves ultralow GNR friction when sliding between AA'-stacked hBN layers. Using the grown structures, we demonstrate the transfer-free fabrication of embedded GNR field-effect devices that exhibit excellent performance at room temperature with mobilities of up to 4,600 cm V s and on-off ratios of up to 10. This paves the way for the bottom-up fabrication of high-performance electronic devices based on embedded layered materials.
在六方氮化硼(hBN)堆叠中对二维材料进行范德华封装是制造超高性能电子器件的一种很有前途的方法。然而,实现范德华封装的现代方法涉及使用机械转移技术进行人工层堆叠,这种方法难以控制、容易受到污染并且无法扩展。在这里,我们报告了在 hBN 堆叠中无转移的高质量石墨烯纳米带(GNR)的直接生长。所生长的嵌入式 GNR 具有非常理想的特性,即超长(长达 0.25mm)、超窄(<5nm)和手性相同的锯齿边缘。我们的原子模拟表明,在 AA'-堆叠的 hBN 层之间滑动时,嵌入式生长的基础机制涉及超低 GNR 摩擦。使用所生长的结构,我们展示了无转移的嵌入式 GNR 场效应器件的制造,该器件在室温下表现出出色的性能,迁移率高达 4600cmV s,开关比高达 10。这为基于嵌入式层状材料的高性能电子器件的自下而上制造铺平了道路。