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可扩展的氮化铟镓纳米线微发光二极管:为下一代显示技术铺平道路。

Scalable InGaN nanowire µ-LEDs: paving the way for next-generation display technology.

作者信息

Veeramuthu Vignesh, Kim Sung-Un, Lee Sang-Wook, Navamathavan R, Chandran Bagavath, Um Dae-Young, Oh Jeong-Kyun, Lee Min-Seok, Kim Yong-Ho, Lee Cheul-Ro, Ra Yong-Ho

机构信息

Division of Advanced Materials Engineering, College of Engineering, Research Center for Advanced Materials Development (RCAMD), Jeonbuk National University (JBNU), Jeonju 54896, South Korea.

Division of Physics, School of Advanced Sciences, VIT University Chennai Campus, Chennai 600127, India.

出版信息

Natl Sci Rev. 2024 Sep 20;12(1):nwae306. doi: 10.1093/nsr/nwae306. eCollection 2025 Jan.

DOI:10.1093/nsr/nwae306
PMID:39764505
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11702689/
Abstract

Ever-increasing demand for efficient optoelectronic devices with a small-footprinted on-chip light emitting diode has driven their expansion in self-emissive displays, from micro-electronic displays to large video walls. InGaN nanowires, with features like high electron mobility, tunable emission wavelengths, durability under high current densities, compact size, self-emission, long lifespan, low-power consumption, fast response, and impressive brightness, are emerging as the choice of micro-light emitting diodes (µLEDs). However, challenges persist in achieving high crystal quality and lattice-matching heterostructures due to composition tuning and bandgap issues on substrates with differing crystal structures and high lattice mismatches. Consequently, research is increasingly focused on scalable InGaN nanowire µLEDs representing a transformative advancement in display technology, particularly for next-generation applications such as virtual/augmented reality and high-speed optical interconnects. This study presents recent progress and critical challenges in the development of InGaN nanowire µLEDs, highlighting their performance and potential as the next-generation displays in consumer electronics.

摘要

对具有小尺寸片上发光二极管的高效光电器件的需求不断增加,推动了它们在自发光显示器中的应用扩展,从微电子显示器到大型视频墙。氮化铟镓纳米线具有高电子迁移率、可调发射波长、高电流密度下的耐久性、紧凑尺寸、自发光、长寿命、低功耗、快速响应和令人印象深刻的亮度等特性,正成为微发光二极管(µLED)的选择。然而,由于在具有不同晶体结构和高晶格失配的衬底上进行成分调整和带隙问题,在实现高质量晶体和晶格匹配异质结构方面仍然存在挑战。因此,研究越来越集中在可扩展的氮化铟镓纳米线µLED上,这代表了显示技术的变革性进展,特别是对于虚拟/增强现实和高速光互连等下一代应用。本研究展示了氮化铟镓纳米线µLED开发的最新进展和关键挑战,突出了它们作为消费电子产品下一代显示器的性能和潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3302/11702689/b61402e79d17/nwae306fig11.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3302/11702689/07294dc57a55/nwae306fig9.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3302/11702689/1fbfc46b3a3d/nwae306fig10.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3302/11702689/b61402e79d17/nwae306fig11.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3302/11702689/07294dc57a55/nwae306fig9.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3302/11702689/1fbfc46b3a3d/nwae306fig10.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3302/11702689/b61402e79d17/nwae306fig11.jpg

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本文引用的文献

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Nanomaterials (Basel). 2024 Mar 12;14(6):511. doi: 10.3390/nano14060511.
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The dissociation of (a+c) misfit dislocations at the InGaN/GaN interface.InGaN/GaN界面处(a+c)型失配位错的解离
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Disentangling the Impact of Point Defect Density and Carrier Localization-Enhanced Auger Recombination on Efficiency Droop in (In,Ga)N/GaN Quantum Wells.
解析点缺陷密度和载流子局域化增强的俄歇复合对(铟镓)氮/氮化镓量子阱效率下降的影响。
ACS Photonics. 2023 Jul 19;10(8):2632-2640. doi: 10.1021/acsphotonics.3c00355. eCollection 2023 Aug 16.
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Identifying the role of carrier overflow and injection current efficiency in a GaN-based micro-LED efficiency droop model.确定载流子溢流和注入电流效率在基于 GaN 的微 LED 效率衰减模型中的作用。
Opt Express. 2023 May 22;31(11):17557-17568. doi: 10.1364/OE.487475.
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Integration Technology of Micro-LED for Next-Generation Display.用于下一代显示器的微发光二极管集成技术
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An Ultrahigh Efficiency Excitonic Micro-LED.一种超高效率激子微 LED。
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