Jeon Dabin, Lee Seung Hun, Lee Sung-Nam
Department of IT Semiconductor Convergence Engineering, Tech University of Korea, Siheung 15073, Republic of Korea.
Department of Semiconductor Engineering, Tech University of Korea, Siheung 15073, Republic of Korea.
Nanomaterials (Basel). 2025 Jun 11;15(12):908. doi: 10.3390/nano15120908.
This study reports a gate-tunable three-terminal optoelectronic synaptic device based on an Al/ZnO nanoparticles (NPs)/SiO/Si structure for neuromorphic in-sensor memory applications. The ZnO NP film, fabricated via spin coating, exhibited strong UV-induced excitatory post-synaptic current (EPSC) responses that were modulated by gate voltage through charge injection across the SiO dielectric rather than by conventional field effect. Optical stimulation enabled short-term synaptic plasticity, with paired-pulse facilitation (PPF) values reaching 185% at a gate voltage of -5.0 V and decreasing to 180% at +5.0 V, confirming gate-dependent modulation of synaptic weight. Repeated stimulation enhanced learning efficiency and memory retention, as demonstrated by reduced pulse numbers for relearning and slower EPSC decay. Wickelgren's power law analysis further revealed a decrease in the forgetting rate under negative gate bias, indicating improved long-term memory characteristics. A 3 × 3 synaptic device array visualized visual memory formation through EPSC-based color mapping, with darker intensities and slower fading observed under -5.0 V bias. These results highlight the critical role of gate-voltage-induced charge injection through the SiO dielectric in controlling optical potentiation and electrical depression, establishing ZnO NP-based optoelectronic synaptic devices as promising platforms for energy-efficient, light-driven neuromorphic computing.
本研究报道了一种基于Al/ZnO纳米颗粒(NPs)/SiO/Si结构的栅极可调谐三端光电突触器件,用于神经形态传感器内存储器应用。通过旋涂制备的ZnO NP薄膜表现出强烈的紫外线诱导兴奋性突触后电流(EPSC)响应,该响应通过跨SiO电介质的电荷注入由栅极电压调制,而非传统的场效应。光刺激实现了短期突触可塑性,在栅极电压为-5.0 V时,双脉冲易化(PPF)值达到185%,在+5.0 V时降至180%,证实了突触权重的栅极依赖性调制。重复刺激提高了学习效率和记忆保持能力,重新学习所需脉冲数减少以及EPSC衰减变慢证明了这一点。威克尔格伦幂律分析进一步揭示了负栅极偏压下遗忘率的降低,表明长期记忆特性得到改善。一个3×3的突触器件阵列通过基于EPSC的颜色映射可视化了视觉记忆形成,在-5.0 V偏压下观察到较暗的强度和较慢的衰减。这些结果突出了通过SiO电介质的栅极电压诱导电荷注入在控制光增强和电抑制方面的关键作用,确立了基于ZnO NP的光电突触器件作为节能、光驱动神经形态计算的有前景平台。