IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598, USA.
Science. 2017 Jun 30;356(6345):1369-1372. doi: 10.1126/science.aan2476.
The International Technology Roadmap for Semiconductors challenges the device research community to reduce the transistor footprint containing all components to 40 nanometers within the next decade. We report on a p-channel transistor scaled to such an extremely small dimension. Built on one semiconducting carbon nanotube, it occupies less than half the space of leading silicon technologies, while delivering a significantly higher pitch-normalized current density-above 0.9 milliampere per micrometer at a low supply voltage of 0.5 volts with a subthreshold swing of 85 millivolts per decade. Furthermore, we show transistors with the same small footprint built on actual high-density arrays of such nanotubes that deliver higher current than that of the best-competing silicon devices under the same overdrive, without any normalization. We achieve this using low-resistance end-bonded contacts, a high-purity semiconducting carbon nanotube source, and self-assembly to pack nanotubes into full surface-coverage aligned arrays.
国际半导体技术蓝图挑战器件研究界,要求在未来十年内将包含所有组件的晶体管尺寸缩小到 40 纳米。我们报告了一种被缩小到如此极端小尺寸的 p 沟道晶体管。该晶体管建基于单根半导体碳纳米管上,其占地面积不到领先的硅技术的一半,而在 0.5 伏的低电源电压下,其每微米的按比例缩小的电流密度超过 0.9 毫安,亚阈值摆幅为每十年 85 毫伏。此外,我们展示了采用相同小尺寸的晶体管,这些晶体管建基于实际高密度的此类纳米管阵列,在相同的过驱动下,提供的电流比最佳竞争的硅器件高,而无需任何按比例缩小。我们通过使用低电阻的端接键合接触、高纯度的半导体碳纳米管源和自组装将纳米管包装成全面积覆盖的排列整齐的阵列来实现这一点。