Feng Bo, Zhu Jingyuan, Xu Chen, Wan Jing, Gan Zelong, Lu Bingrui, Chen Yifang
Fudan University, Shanghai, China.
JiHua Laboratory, Foshan, China.
Nanoscale Res Lett. 2019 Jan 30;14(1):39. doi: 10.1186/s11671-019-2868-3.
This work developed an all-Si photodetector with a surface plasmonic resonator formed by a sub-wavelength Au grating on the top of a Si-nanowire array and the same one beside the wires. The Au/Si interface with a Schottky barrier allows the photo-electron detection in near-infrared wavelength based on the internal emission of hot electrons generated by the surface plasmons in the cavity. Meanwhile, the Au sub-wavelength grating on the Si nanowire array acts as a polarizer for polarimetric detection. Finite-difference time-domain method was applied in the design of the novel device and state-of-art nanofabrication based on electron beam lithography was carried out. The characterization of the photo-electronic properties as well as the polarimetric detection demonstrate that the fabricated detectors on the silicon substrate possesses great prospects for sensing technology on all-Si.
这项工作开发了一种全硅光电探测器,其表面等离子体谐振器由硅纳米线阵列顶部的亚波长金光栅以及线旁的相同光栅形成。具有肖特基势垒的金/硅界面基于腔体内表面等离子体产生的热电子的内发射实现近红外波长的光电子检测。同时,硅纳米线阵列上的金亚波长光栅用作偏振检测的偏振器。在新型器件的设计中应用了时域有限差分法,并基于电子束光刻进行了先进的纳米制造。光电子特性以及偏振检测的表征表明,在硅衬底上制造的探测器在全硅传感技术方面具有广阔前景。