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在氧化硅电阻开关中导丝的原位成像。

In situ imaging of the conducting filament in a silicon oxide resistive switch.

出版信息

Sci Rep. 2012;2:242. doi: 10.1038/srep00242. Epub 2012 Jan 31.

Abstract

The nature of the conducting filaments in many resistive switching systems has been elusive. Through in situ transmission electron microscopy, we image the real-time formation and evolution of the filament in a silicon oxide resistive switch. The electroforming process is revealed to involve the local enrichment of silicon from the silicon oxide matrix. Semi-metallic silicon nanocrystals with structural variations from the conventional diamond cubic form of silicon are observed, which likely accounts for the conduction in the filament. The growth and shrinkage of the silicon nanocrystals in response to different electrical stimuli show energetically viable transition processes in the silicon forms, offering evidence for the switching mechanism. The study here also provides insights into the electrical breakdown process in silicon oxide layers, which are ubiquitous in a host of electronic devices.

摘要

在许多电阻式开关系统中,导电丝的性质一直难以捉摸。通过原位透射电子显微镜,我们对氧化硅电阻开关中丝的实时形成和演变进行了成像。电形成过程揭示了从氧化硅基质中局部富集硅的过程。观察到具有与传统硅的金刚石立方形式的结构变化的半金属硅纳米晶体,这可能解释了丝中的传导。硅纳米晶体在不同电刺激下的生长和收缩显示出硅形式中可行的能量转换过程,为开关机制提供了证据。本研究还深入了解了氧化硅层中的电击穿过程,这在许多电子设备中都很普遍。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/fb94/3268812/4f1eaff45593/srep00242-f2.jpg

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